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This book presents fundamental process technologies for semiconductor lasers. Process technologies regarding semiconductor-laser fabrication are discussed with emphasis mainly on crystal-growth methods such as liquid phase epitaxy, metalorganic chemical vapor deposition, molecular beam epitaxy, chemical beam epitaxy and so on. Representative semiconductor-laser performances are described, and the latest topics including mode control and surface-emitting lasers are introduced.
The purpose of this book is to describe the design principles of semiconductor lasers, mainly from the fabrication point of view. We describe advanced technologies of semiconductor lasers, particularly device design and fabrication, and semiconductor-laser characteristics.
In Chap. 1 we start out with the history of semiconductor-laser development and applications.
Then in Chap. 2 materials for use in semiconductor lasers ranging from short to long wavelengths are reviewed.
Chapter 3 touches on the basic design principles of semiconductor-laser devices.
In Chap.4 we review epitaxies for laser fabrication.
Chapter 5 is devoted to the technology for liquid phase epitaxy and
Chap. 6 is on vapor phase and beam epitaxies.
Chapter 7 introduces characterizations of laser materials.
In Chap. 8 the fabrication and characteristics of semiconductor lasers are detailed.
Mode-control techniques are presented in Chap. 9,
and finally surface emitting lasers are introduced in Chap. 10